
Top-3 semiconductor equipment maker
Equipment is cleaned with ultrapure water before shipment and must comply fully with UPW specification. Ion concentration and particle counts are tightly regulated — among the most demanding applications a system can face.
- Resistivity
- ≥ 18.2 MΩ·cm
- Particle
- < 0.05 μm (50 nm)
- Heavy metals
- < 10 ppt
- Application
- Wafer cleaning
- 2Pass-RO + CEDI + RDICEDI with a semiconductor-grade mixed-bed polisher meets both the resistivity limit and the trace-impurity requirement.
- High-purity PVDF / PFA pipingSemiconductor-grade piping throughout, with seamless fusion welding to prevent secondary contamination.
- Passed strict verificationCleared every trace heavy-metal and particle test and was accepted on handover.








